Is Yokogawa Minimal Fab Suitable for Image Sensor Production?

Image Sensors World        Go to the original article...

Yokogawa brought AIST, Japan-originated Minimal Fab project to production. It uses 0.5-inch wafers and does not need a clean room to operate:








Minimal Fab process implements most of the steps needed for image sensor production, even a wafer thinning and bonding option. The most notable omission is a high energy ion implantation. So far, only lower than 50KeV implantation is supported. For a higher energy, one needs to process wafers at the large fab.


AIST presents Minimal Fab advantages:


There is a similar Futrfab work in the US promoting 2-inch wafer fab. However, its progress appears to be slow and it is far from being a market-ready solution for now.

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