SPADs in Globalfoundries’ 55nm BCD Process

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It appears that Globalfoundries becomes a viable option for SPAD-based sensors. At least, three Globalfoundries' employees are co-authors of the following paper:

IEEE Journal of Selected Topics in Quantum Electronics publishes a paper "Engineering Breakdown Probability Profile for PDP and DCR Optimization in a SPAD Fabricated in a Standard 55nm BCD Process" by Francesco Gramuglia, Pouyan Keshavarzian, Ekin Kizilkan, Claudio Bruschini, Shyue Seng Tan, Michelle Tng, Elgin Quek, Myung-Jae Lee, and Edoardo Charbon from EPFL (Switzerland), Globalfoundries (Singapore), KIST (Korea).

"In this paper, we present SPADs based on DPW/BNW junctions in a standard Bipolar-CMOS-DMOS (BCD) technology with results comparable to the state-of-the-art in terms of sensitivity and noise in a deep sub-micron process. Technology CAD (TCAD) simulations demonstrate the improved PDP with the simple addition of a single existing implant, which allows for an engineered performance without modifications to the process. The result is an 8.8 μm diameter SPAD exhibiting ~2.6 cps/μm^2 DCR at 20°C with 7 V excess bias. The improved structure obtains a PDP of 62 % and ~4.2 % at 530 nm and 940 nm, respectively. Afterpulsing probability is ~0.97 % and the timing response is 52 ps FWHM when measured with integrated passive quench/active recharge circuitry at 3V excess bias."

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